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UV协同ClO2去除三氯生及其降解产物的研究
摘要点击 1632  全文点击 1112  投稿时间:2014-07-16  修订日期:2014-10-11
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中文关键词  UV/ClO2  三氯生  去除  GC/MS  降解产物
英文关键词  UV/ClO2  TCS  removal  GC/MS  degradation product
作者单位E-mail
李玉瑛 五邑大学化学与环境工程学院, 江门 529000
厦门理工学院水资源环境研究所, 厦门 361024 
wyuchemlyy@126.com 
何文龙 五邑大学化学与环境工程学院, 江门 529000
厦门理工学院水资源环境研究所, 厦门 361024 
 
李青松 厦门理工学院水资源环境研究所, 厦门 361024 leetsingsong@sina.com 
金伟伟 厦门理工学院水资源环境研究所, 厦门 361024
浙江工业大学建筑工程学院, 杭州 310014 
 
陈国元 厦门理工学院水资源环境研究所, 厦门 361024  
李国新 厦门理工学院水资源环境研究所, 厦门 361024  
中文摘要
      采用UV/ClO2工艺对三氯生(TCS)的去除进行了研究,考察了初始pH、ClO2投加量、TCS初始浓度、腐殖酸(HA)在UV/ClO2联用工艺中对TCS降解的影响. 研究表明,UV/ClO2工艺可以有效去除TCS且具有协同作用,光强为6.5 μW·cm-2、ClO2投加量为0.5 mg·L-1和TCS浓度为300 μg·L-1时,单独UV和ClO2在1 min内对TCS的去除分别为5.23%和84.93%,UV/ClO2联用工艺TCS在1 min内去除可达到99.13%. 实验范围内(pH 6~9)随着pH的增大TCS去除率从99.4%升到99.63%; 增大ClO2投加量可以提高TCS的去除,ClO2投加量从0.5~1.5 mg·L-1时TCS去除率由98.1%提高到99.89%; TCS初始浓度与去除率呈负相关,初始浓度从100~500 μg·L-1时TCS去除率由99.98%下降到94.39%; 低浓度的腐殖酸有利于TCS的去除,高浓度的腐殖酸则相反. GC/MS对TCS的UV、ClO2和UV/ClO2的降解产物分析表明,TCS的主要降解产物包括2,4-二氯苯酚(2,4-DCP)、2,7-二氯代二苯并-对-二噁英(2,7-DCDD)等.
英文摘要
      The UV/ClO2 process for triclosan (TCS) removal was studied. The influences of several factors such as the initial pH, dose of ClO2, initial concentration of TCS and humic acid(HA) on TCS degradation in the UV/ClO2 combined process were discussed. The results showed that the UV/ClO2 process could effectively remove TCS and had a synergistic effect. When the light intensity was 6.5 μW·cm-2, the dose of ClO2 was 0.5mg·L-1 and the concentration of TCS was 300 μg·L-1, when UV and ClO2 were applied alone, the TCS removal rates within 1 min were only 5.23% and 84.93% respectively. The removal rate reached up to 99.13% after 1 min degradation using the UV/ClO2 combined process. In test conditions (pH 6-9), the removal rate increased from 99.4% to 99.63% with the increase of pH. Increasing dose of ClO2 could promote TCS removal. When the dose of ClO2 was 0.5-1.5 mg·L-1, the removal rate was increased from 98.1% to 99.89%. The initial concentration of TCS was negatively correlated with the removal rate. When the initial concentration increased from 100-500 μg·L-1, the removal rate of TCS was decreased from 99.98% to 94.39%. Low concentration of humic acid was beneficial to the removal of TCS, and high concentration of it had the opposite effect. Degradation products of TCS were investigated by GC/MS. Degradation of TCS by the processes of UV,ClO2 and UV/ClO2 also indicated that the main degradation products of the TCS were 2, 4-dichlorophenol (2,4-DCP), 2,7-dichlorodibenzo-p-dioxin(2,7-DCDD), etc.

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