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UV/H2O2降解羟苯甲酮反应动力学及影响因素
摘要点击 2374  全文点击 1343  投稿时间:2014-10-24  修订日期:2015-02-03
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中文关键词  羟苯甲酮  UV/H2O2  有机防晒剂  去除率  降解速率常数
英文关键词  BP-3  UV/H2O2 process  organic sunscreens  removal rate  degradation rate constant
作者单位E-mail
冯欣欣 常州大学环境与安全工程学院, 常州 213164 fengxinxin0907@163.com 
杜尔登 常州大学环境与安全工程学院, 常州 213164 duerdeng@cczu.edu.cn 
郭迎庆 常州大学环境与安全工程学院, 常州 213164  
李华杰 常州大学环境与安全工程学院, 常州 213164  
刘翔 清华大学环境学院, 北京 100084  
周方 清华大学环境学院, 北京 100084  
中文摘要
      有机防晒剂随着日常使用不断进入环境中,成为一类新兴污染物. 考察了UV/H2O2工艺对典型有机防晒剂羟苯甲酮(BP-3)的水相光化学降解特征,并对BP-3降解反应的影响因素包括初始BP-3浓度、H2O2浓度、UV光强、共存阳离子和阴离子、叔丁醇和腐殖酸投加量等进行了研究. 结果表明,BP-3的降解速率常数随初始BP-3浓度升高而降低,随着H2O2浓度增大而增高,随着UV光强增强而增大; 阴离子会在一定程度上降低反应速率,阳离子中Fe3+会产生类芬顿反应,促进生成·OH,对降解反应有显著的促进作用,投加叔丁醇和腐殖酸皆会抑制降解反应进行. 采用每一对数减小级电能输入(EEo)指标对UV/H2O2工艺的电能利用效率进行了评价,Fe3+的加入显著减小了EEo. 研究不同因素对UV/H2O2工艺降解效果的影响,可对实际工程中采用UV/H2O2去除苯甲酮类有机防晒剂提供参考.
英文摘要
      Organic sunscreens continue to enter the environment through people's daily consumption, and become a kind of emerging contaminants. The photochemical degradation of benzophenone-3 (BP-3) in water by UV/H2O2 process was investigated. Several factors, including the initial BP-3 concentration, H2O2 concentration, UV light intensity, coexisting cations and anions, humic acid and tert-butyl alcohol, were also discussed. The results showed that BP-3 degradation rate constant decreased with increasing initial BP-3 concentration, while increased with increasing H2O2 dosage and UV intensity. Coexisting anions could reduce the degradation rate, while coexisting ferric ions could stimulate the production of·OH through Fenton-like reaction, further significantly accelerated BP-3 degradation process. The BP-3 degradation would be inhibited by humic acid or tert-butyl alcohol. The electrical energy per order (EEo) values were also calculated to evaluate the cost of BP-3 degradation by UV/H2O2 process. The addition of ferric ions significantly reduced the value of EEo. The investigation of processing parameter could provide a reference for the practical engineering applications of benzophenone compounds removal by UV/H2O2 process.

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